The influence of the substrate temperature change character during the growth on the topology of the Ge/Si(100) film surface
- Authors: Lunin LS1, Bavizhev MD1, Sysoev IA1, Lapin VA1, Kuleshov DS1, Malyavin FF1
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Affiliations:
- Southern Scientific Center
- Issue: No 3 (2012)
- Pages: 98-103
- Section: Articles
- URL: https://journals.rudn.ru/engineering-researches/article/view/5212
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