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<article xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:ali="http://www.niso.org/schemas/ali/1.0/" article-type="research-article" dtd-version="1.2" xml:lang="en"><front><journal-meta><journal-id journal-id-type="publisher-id">RUDN Journal of Political Science</journal-id><journal-title-group><journal-title xml:lang="en">RUDN Journal of Political Science</journal-title><trans-title-group xml:lang="ru"><trans-title>Вестник Российского университета дружбы народов. Серия: Политология</trans-title></trans-title-group></journal-title-group><issn publication-format="print">2313-1438</issn><issn publication-format="electronic">2313-1446</issn><publisher><publisher-name xml:lang="en">Peoples’ Friendship University of Russia named after Patrice Lumumba (RUDN University)</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="publisher-id">31851</article-id><article-id pub-id-type="doi">10.22363/2313-1438-2022-24-3-460-479</article-id><article-categories><subj-group subj-group-type="toc-heading" xml:lang="en"><subject>DIGITAL POLITICS</subject></subj-group><subj-group subj-group-type="toc-heading" xml:lang="ru"><subject>ЦИФРОВОЕ ПРОСТРАНСТВО ПОЛИТИКИ</subject></subj-group><subj-group subj-group-type="article-type"><subject>Research Article</subject></subj-group></article-categories><title-group><article-title xml:lang="en">Digital Nomads and Migration Processes in the Russian IT: A Political Analysis</article-title><trans-title-group xml:lang="ru"><trans-title>Цифровые номады и миграционные процессы в российской IT-сфере: политологический анализ</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author"><contrib-id contrib-id-type="orcid">https://orcid.org/0000-0002-0459-7380</contrib-id><name-alternatives><name xml:lang="en"><surname>Taisheva</surname><given-names>Vasilya V.</given-names></name><name xml:lang="ru"><surname>Таишева</surname><given-names>Василя Варисовна</given-names></name></name-alternatives><bio xml:lang="en"><p>PhD in Political Science, Senior Lecturer of the Department of Comparative Politics</p></bio><bio xml:lang="ru"><p>кандидат политических наук, старший преподаватель кафедры сравнительной политологии</p></bio><email>taisheva-vv@rudn.ru</email><xref ref-type="aff" rid="aff1"/></contrib></contrib-group><aff-alternatives id="aff1"><aff><institution xml:lang="en">Peoples’ Friendship University of Russia</institution></aff><aff><institution xml:lang="ru">Российский университет дружбы народов</institution></aff></aff-alternatives><pub-date date-type="pub" iso-8601-date="2022-09-07" publication-format="electronic"><day>07</day><month>09</month><year>2022</year></pub-date><volume>24</volume><issue>3</issue><issue-title xml:lang="en">Internet and Politics</issue-title><issue-title xml:lang="ru">Интернет и политика</issue-title><fpage>460</fpage><lpage>479</lpage><history><date date-type="received" iso-8601-date="2022-09-07"><day>07</day><month>09</month><year>2022</year></date></history><permissions><copyright-statement xml:lang="en">Copyright ©; 2022, Taisheva V.V.</copyright-statement><copyright-statement xml:lang="ru">Copyright ©; 2022, Таишева В.В.</copyright-statement><copyright-year>2022</copyright-year><copyright-holder xml:lang="en">Taisheva V.V.</copyright-holder><copyright-holder xml:lang="ru">Таишева В.В.</copyright-holder><ali:free_to_read xmlns:ali="http://www.niso.org/schemas/ali/1.0/"/><license><ali:license_ref xmlns:ali="http://www.niso.org/schemas/ali/1.0/">https://creativecommons.org/licenses/by-nc/4.0</ali:license_ref></license></permissions><self-uri xlink:href="https://journals.rudn.ru/political-science/article/view/31851">https://journals.rudn.ru/political-science/article/view/31851</self-uri><abstract xml:lang="en"><p style="text-align: justify;">IT industry is one of the top priority areas for economic development not only in Russia, but also in other countries worldwide. The Russian government is pursuing a policy to promote the development of information technology in the country and support specialists in this field. The IT sphere is one of the most attractive among applicants, and the IT market volume shows stable growth. However, in the context of tightening Western sanctions and the aggravation of the political situation in February-March 2022, the Russian IT industry faced a massive outflow of qualified specialists from Russia. And although the problem of personnel shortage (including due to migration) has existed in Russia for a long time, the volume of the migration flow of IT specialists over the specified period was significant for the domestic IT industry. The author attempts to identify the reasons for the migration of IT specialists, considering various push and pull factors that exist in the context of the Russian IT market. To achieve this goal, the author conducted a semi-structured survey among representatives of the IT sector, including professionals who have already moved or are planning to move in the near future, as well as those who have decided to stay in Russia. Based on the results of the study, some particular and general factors for the migration of IT specialists were identified. In addition, the article gives the proposals of the interviewed specialists regarding state support for the IT industry.</p></abstract><trans-abstract xml:lang="ru"><p style="text-align: justify;">IT-отрасль сегодня является одним из приоритетных направлений развития экономики не только в России, но и в зарубежных странах. Российское правительство проводит политику по содействию развитию информационных технологий в стране и поддержке специалистов в данной области. IT-сфера является одной из наиболее привлекательных среди соискателей, а объем IT-рынка показывает стабильный рост. Однако в условиях ужесточения западных санкций и обострения политической обстановки в феврале-марте 2022 г. российская IT-отрасль столкнулась с массовым оттоком квалифицированных специалистов из России. И хотя проблема нехватки кадров (в том числе по причине миграции) существует в России не первый год, объем миграционного потока специалистов за указанный период явился существенным для отечественной IT-индустрии. Автор делает попытку выявить причины миграции специалистов в области информационных технологий, рассматривая различные факторы выталкивания и притяжения, существующие в контексте российского IT-рынка. Для достижения поставленной цели был проведен полуструктурированный опрос среди представителей IT-сферы. Респондентами выступили IT-специалисты, которые уже переехали или планируют переезд в ближайшем будущем, а также те, кто принял решение остаться в России. По итогам исследования были определены некоторые частные и общие факторы миграции IT-специалистов. Кроме того, приводятся предложения в области информационных технологий относительно поддержки IT-индустрии со стороны государства.</p></trans-abstract><kwd-group xml:lang="en"><kwd>migration</kwd><kwd>information technology</kwd><kwd>digital nomad</kwd><kwd>identity</kwd><kwd>IT</kwd><kwd>relocation</kwd></kwd-group><kwd-group xml:lang="ru"><kwd>миграция</kwd><kwd>информационные технологии</kwd><kwd>цифровой кочевник</kwd><kwd>идентичность</kwd><kwd>IT</kwd><kwd>релокация</kwd></kwd-group><funding-group><award-group><funding-source><institution-wrap><institution xml:lang="ru">Статья подготовлена при финансовой поддержке РФФИ и КН РА в рамках научного проекта № 20-511-05025 — арм_а «Развитие гражданской идентичности на постсоветском пространстве: тенденции, вызовы, риски (на примере России и Армении)».</institution></institution-wrap><institution-wrap><institution xml:lang="en">The reported study was funded by RFBR and SC RA, project 20-511-05025 «The development of civic identity in the post-Soviet space: trends, challenges, risks (on the example of Russia and Armenia)».</institution></institution-wrap></funding-source></award-group></funding-group></article-meta></front><body></body><back><ref-list><ref id="B1"><label>1.</label><citation-alternatives><mixed-citation xml:lang="en">Antoshchuk, I., &amp; Ledeneva, V. 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