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<article xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:ali="http://www.niso.org/schemas/ali/1.0/" article-type="research-article" dtd-version="1.2" xml:lang="en"><front><journal-meta><journal-id journal-id-type="publisher-id">Discrete and Continuous Models and Applied Computational Science</journal-id><journal-title-group><journal-title xml:lang="en">Discrete and Continuous Models and Applied Computational Science</journal-title><trans-title-group xml:lang="ru"><trans-title>Discrete and Continuous Models and Applied Computational Science</trans-title></trans-title-group></journal-title-group><issn publication-format="print">2658-4670</issn><issn publication-format="electronic">2658-7149</issn><publisher><publisher-name xml:lang="en">Peoples' Friendship University of Russia named after Patrice Lumumba (RUDN University)</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="publisher-id">47508</article-id><article-id pub-id-type="doi">10.22363//2658-4670-2025-33-4-461-470</article-id><article-id pub-id-type="edn">HMKEYN</article-id><article-categories><subj-group subj-group-type="toc-heading" xml:lang="en"><subject>Physics and Astronomy</subject></subj-group><subj-group subj-group-type="toc-heading" xml:lang="ru"><subject>Физика</subject></subj-group><subj-group subj-group-type="article-type"><subject>Research Article</subject></subj-group></article-categories><title-group><article-title xml:lang="en">Ar-O$_2$ plasma of resonant UHF discharge for chitosan's films processed</article-title><trans-title-group xml:lang="ru"><trans-title>Ar-O$_2$ плазма резонансного СВЧ-разряда для обработки хитозановых плёнок</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author"><contrib-id contrib-id-type="orcid">https://orcid.org/0009-0000-1925-4711</contrib-id><name-alternatives><name xml:lang="en"><surname>Artemyev</surname><given-names>Andrey V.</given-names></name><name xml:lang="ru"><surname>Артемьев</surname><given-names>А. В.</given-names></name></name-alternatives><address><country country="RU">Russian Federation</country></address><bio xml:lang="en"><p>Postgraduate Student at the Institute of Physical Research and Technology, Junior Researcher at the Institute<br/>of Physical Research and Technology</p></bio><email>artemyev_anvl@pfur.ru</email><xref ref-type="aff" rid="aff1"/></contrib><contrib contrib-type="author"><contrib-id contrib-id-type="orcid">https://orcid.org/0000-0002-6411-5988</contrib-id><name-alternatives><name xml:lang="en"><surname>Kritchenkov</surname><given-names>Andrey S.</given-names></name><name xml:lang="ru"><surname>Критченков</surname><given-names>А. С.</given-names></name></name-alternatives><address><country country="RU">Russian Federation</country></address><bio xml:lang="en"><p>Doctor of Chemical Sciences, Associate Professor, Department of Human Ecology and Bioelementology</p></bio><email>kritchenkov_as@pfur.ru</email><xref ref-type="aff" rid="aff1"/></contrib></contrib-group><aff-alternatives id="aff1"><aff><institution xml:lang="en">RUDN University</institution></aff><aff><institution xml:lang="ru">Российский университет дружбы народов</institution></aff></aff-alternatives><pub-date date-type="pub" iso-8601-date="2025-12-07" publication-format="electronic"><day>07</day><month>12</month><year>2025</year></pub-date><volume>33</volume><issue>4</issue><issue-title xml:lang="en">VOL 33, No4 (2025)</issue-title><issue-title xml:lang="ru">ТОМ 33, №4 (2025)</issue-title><fpage>461</fpage><lpage>470</lpage><history><date date-type="received" iso-8601-date="2025-12-06"><day>06</day><month>12</month><year>2025</year></date></history><permissions><copyright-statement xml:lang="en">Copyright ©; 2025, Artemyev A.V., Kritchenkov A.S.</copyright-statement><copyright-statement xml:lang="ru">Copyright ©; 2025, Артемьев А.В., Критченков А.С.</copyright-statement><copyright-year>2025</copyright-year><copyright-holder xml:lang="en">Artemyev A.V., Kritchenkov A.S.</copyright-holder><copyright-holder xml:lang="ru">Артемьев А.В., Критченков А.С.</copyright-holder><ali:free_to_read xmlns:ali="http://www.niso.org/schemas/ali/1.0/"/><license><ali:license_ref xmlns:ali="http://www.niso.org/schemas/ali/1.0/">https://creativecommons.org/licenses/by-nc/4.0</ali:license_ref></license></permissions><self-uri xlink:href="https://journals.rudn.ru/miph/article/view/47508">https://journals.rudn.ru/miph/article/view/47508</self-uri><abstract xml:lang="en"><p>This article explores the modification of chitosan films by treating Ar-O$_2$ with microwave plasma. The main idea is to use resonant plasma generation methods to treat chitosan films. Spectral and energy characteristics of microwave plasma are obtained. The mechanical properties, swelling, and solubility of chitosan films exposed to microwave plasma are studied. The dependence of film properties on the duration of treatment with resonant microwave plasma is demonstrated.</p></abstract><trans-abstract xml:lang="ru"><p>Статья посвящена исследованию модификации хитозановых пленок при обработке Ar-O$_2$ плазмой СВЧ-разряда. Основная идея заключается в использовании резонансных методов создания плазмы для обработки хитозановых плёнок. Получены спектральные и энергетические характеристики плазмы СВЧ-разряда. Исследованы механические свойства, набухание и растворимость хитозановых плёнок под воздействием плазмы СВЧ-разряда. Показана зависимость свойств плёнок от времени обработки плазмой резонансного СВЧ-разряда.</p></trans-abstract><kwd-group xml:lang="en"><kwd>plasma</kwd><kwd>resonance</kwd><kwd>UHF discharge</kwd><kwd>microwave plasma</kwd><kwd>chitosan</kwd><kwd>film modification</kwd><kwd>swelling</kwd><kwd>solubility</kwd><kwd>experimental studies</kwd></kwd-group><kwd-group xml:lang="ru"><kwd>плазма</kwd><kwd>резонанс</kwd><kwd>СВЧ-разряд</kwd><kwd>микроволновая плазма</kwd><kwd>хитозан</kwd><kwd>модификация плёнок</kwd><kwd>растворимость</kwd><kwd>набухание</kwd><kwd>экспериментальные исследования</kwd></kwd-group><funding-group/></article-meta><fn-group/></front><body></body><back><ref-list><ref id="B1"><label>1.</label><mixed-citation>Inagaki, N., Narushim, K., Tuchida, N. &amp; K., M. Surface characterization of plasma-modified poly(ethylene terephthalate) film surfaces. 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